General Plasma Inc completed the acquisition of the Ion Source product line from Advanced Energy Industries, Inc., based in Fort Collins, Colorado, General Plasma announced in summer 2008.
“The integ…
General Plasma Inc completed the acquisition of the Ion Source product line from Advanced Energy Industries, Inc., based in Fort Collins, Colorado, General Plasma announced in summer 2008. “The integration of Advanced Energy“s linear ion sources product line into GPI“s Advanced Sources division secures GPI“s position as the world leader in anode layer ion source technology”, said John Madocks, president and founder of General Plasma. “This new product line will allow GPI“s Advanced Sources division to meet a wider set of customer needs and presents significant opportunities for growth into new markets, particularly in the rapidly growing solar energy segment”. “General Plasma extends its hallmark customer support to Advanced Energy“s ion source customers, offering application support and process development services. GPI“s experience applying our patented ion sources to substrate etching, cleaning, treatment and deposition processes will assist the ion source customer base”, Mr. Madocks said. General Plasma is a leader in the field of vacuum thin film coating. The firm“s industry leading, patented ion source, sputter magnetron and plasma source innovations are increasingly penetrating the solar energy, architectural glass, data storage, scientific research and other markets demanding economical, high quality thin films.