Lumineq, a new business unit that is strongly complemented by Beneq’s world-leading ALD technology and related thin film coating equipment, is the largest in the world for atomic layer deposition (ALD) enabled products.
With Beneq’s acquisition of the thin film electroluminescent (TFEL) business from US Planar Systems, Inc., the factory located in Olarinluoma, Finland has become the largest in the world for atomic layer deposition (ALD) enabled products.
This factory is now home to Lumineq, a new business unit that is strongly complemented by Beneq’s world-leading ALD technology and related thin film coating equipment. Additionally, the factory is the longest established of its kind, with an impressive 30-year history in this niche field, and originally belonging to a Finnish pioneering company in electronics.
“Our Lumineq factory offers customers 24/7 capability, industrial-scale capacity and specialized in-house know-how to tackle any thin film challenge that can be solved with ALD technology,” says Sampo Ahonen, CEO of Beneq. “The people and products of Lumineq have built a solid reputation for rugged reliability with their customers. This is what has made them first in this field.”
Lumineq employs 80 specialists with careers averaging over 10 years in this specific TFEL area. The 10,000 sq.m. facilities with its quality certified systems include all the knowledge of ALD technology under one roof: substrates, chemicals, coatings, finishing and assemblies. Additionally, a state-of-the-art clean room (2,000 sq.m.) provides an ideal environment for scientific research.
In addition to the world-leading ALD coating services, the Lumineq factory offers other highly specialized services: metal sputtering, optical bonding, indium doped tin oxide (ITO), laser cutting, metal patterning and acidic etching, chemical Ni growth and substrate cleaning.
Customers are invited to outsource ALD-related and other thin film work to Lumineq or use the comprehensive facilities as a protoshop or as an extension of their own R&D department.